| Microwave Source | Imported professional microwave source |
|---|---|
| Power Supply | AC220V±10%，50HZ，10A/16A |
| Microwave Frequency | 2450MHz |
| Microwave Input Power | 1500W/3000W |
| Microwave Output Power | Standard 1000W, optional dual magnetron three-dimensional vertical array 2000W |
| Microwave power adjustment method | continuously adjustable |
| Material of Microwave Resonant Cavity | austenitic stainless steel |
| Microwave Resonant Cavity Volume | 45L |
| Microwave Cavity Modes | multimodal |
| Continuous Working Time | ≥24h |
| Primary Temperature Measurement Method | PT1000 Titanium Platinum Resistors |
|---|---|
| Temperature Sensor Range | 0-300℃ |
| Maximum Operating Temperature | High Resolution Penetrating Fast Sensitive Response Infrared Sensor |
| Operating Temperature Control Range | 0-300℃ |
| Temperature Control Accuracy | ±1℃ |
| Response Speed | 10ms |
| Pressure Measurement Method | piezoelectric ceramic |
|---|---|
| Pressure Sensor Range | 0-10MPa |
| Maximum Working Pressure | 6MPa |
| Working Pressure Control Range | 0-6MPa |
| Pressure Measurement Accuracy | 0.01MPa |
| Response Speed | 7ms |
| Norm | 100ml |
|---|---|
| Material | "Outer tank: polyether ether ketone resin (PEEK) Inner tank: polytetrafluoroethylene (PTFE)" |
| Maximum withstand voltage | 15MPa |
| Frequency of use | Non-disposable, reusable |
| Rotary table station | 6bit/8bit/10bit6bit/8bit/10bit |
|---|---|
| Temperature and pressure measurement and control system | Equipped with a single-channel temperature and pressure measurement and control system specially designed for parallel systems, realizing simultaneous control of temperature and pressure Equipped with a single-channel temperature and pressure measurement and control system specially designed for parallel systems, realizing simultaneous control of temperature and pressure |
| Whole Tank Temperature and Pressure Measurement System | / |
| Full tank planetary magnetic stirring | Can be equipped with the same number of turntable stations of the whole tank mixing system, all the mixing points to follow the rotation of the turntable and turntable relative to the stationary, continuous mixing without interruption, no intermittent |
| High Pressure Reaction Vessel Specification | 100ml |
| Ultrasound source | / |
|---|---|
| Ultrasonic frequency | / |
| Ultrasonic power | / |
| Ultrasonic power adjustment method | / |
| Ultrasonic probe material | / |
| Ultrasonic Probe Specifications | / |
| Ultrasonic mode | / |
| Ultrasonic high pressure reaction vessel | / |
| Fixed-position magnetic stirring | 500r/min |
|---|---|
| Mechanical stirring | / |
| Digital Mechanical Stirring | / |
| Development Platform | Android-based |
|---|---|
| Screen | 5-inch monochrome LCD |
| Processing Unit | |
| Random Access Memory | |
| Memory | |
| Real-time Monitoring System | / |
| USB interface | / |
| Temperature-Pressure Coordinated Control | Temperature/pressure dual measurement and control system, real-time monitoring of temperature/pressure changes in the reaction system, up to the set value of the instrument automatically control temperature and pressure. |
| Microwave-Ultrasonic Synergistic Control | / |
| Cooling System | air cooling |
|---|
| Wavelength | |
|---|---|
| Power | |
| Reaction Vessel Material | |
| Light Intensity Detection |
| Pre-Injection Booster System | |
|---|---|
| Solid Phase Reaction Apparatus | |
| Photocatalytic Module | |
| Microwave Radiation Synchronized Cooling | |
| Helical Tube Flow Reactor |
| ID | Organization/Institution/Company | Sector | Purchase date |
|---|
